Detail Application of Silicon Carbide

Because of SiC physical and electronic properties,silicon carbide based device are well suitable for short wavelength optoelectronic, high temperature, radiation resistant, and high-power/high-frequency electronic devices,compared with Si and GaAs based device.

Many researchers know the general SiC application:III-V Nitride Deposition;Optoelectronic Devices;High Power Devices;High Temperature Devices;High Frequency Power Devices.But few people knows detail applications, here we list some detail application and make some explanations:

1.SiC substrate for X-ray monochromators: such as using SiC's large d-spacing of about 15 A

2.SiC substrate for high voltage devices

3.SiC substrate for diamond film growth by microwave plasma-enhanced chemical vapor deposition

4.For silicon carbide p-n diode

5.SiC substrate for optical window: such as for very short (< 100 fs) and intense (> 100 GW/cm2) laser pulses with a

wavelength of 1300 nm. It should have a low absorption coefficient and a low two photon absorption coefficient for 1300 nm

6.SiC substrate for heat spreader: For example,the Silicon carbide crystal will be capillary bonded on a flat gain chip surface of

VECSEL (Laser) to remove the generated pump heat. Therefore, the following properties are important:

1)Semi-insulating type required to prevent free carrier absorption of the laser light

2) Double side polished are preferred

3)Surface roughness:  < 2nm, so that the surface is enough flat for bonding

7.SiC substrate for THz system application: Normally it require THz transparency

8.SiC substrate for epitaxial graphene on SiC:Graphene epitaxy on off axis substrate and on axis are both available,

surface side on C-face or Si face are both available.

9.SiC substrate for process development loke ginding, dicing and etc

10.SiC substrate for fast photo-electric switch

11.SiC substrate for heat sink: thermal conductivity and thermal expansion are concerned.

12.SiC substrate for laser: optical, surface and stranparence  are concerned.

13.SiC substrate for III-V epitaxy, normally off axis substrate are required.

Xiamen Powerway Advanced Material Co.,Limited is an expert in SiC substrate,

can give researchers suggestions in different application.

Source:PAM-XIAMEN

If you need more information about Detail Application of Silicon Carbide, please visit http://www.semiconductorwafers.net

or send us email at luna@powerwaywafer.com and powerwaymaterial@gmail.com