Ion beam irradiation has been examined as a method for creating nanoscale semiconductor pillar and cone structures, but has the drawback of inaccurate nanostructure placement. We report on a method for creating and templating nanoscale InAs spikes by focused ion beam (FIB) irradiation of both homoepitaxial InAs films and heteroepitaxial InAs on InP substrates. These 'nanospikes' are created as In droplets, formed due to FIB irradiation, act as etch masks for the underlying InAs. By pre-patterning the InAs to influence In droplet movement, nanospike locations on homoepitaxial InAs may be controlled with limited accuracy. Creating nanospikes using an InAs/InP heterostructure provides an additional measure of control over where the spikes form because nanospikes will not form on exposed regions of InP. This effect may be exploited to accurately control nanospike placement by pre-patterning an InAs/InP heterostructure to control the location of the InAs/InP interface. Using this heterostructure templating method it is possible to accurately place nanospikes into regular arrays that may be useful for a variety of applications.

Source:IOPscience

For more information, please visit our website: www.semiconductorwafers.net,

send us email at angel.ye@powerwaywafer.com or powerwaymaterial@gmail.com